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Variable Attenuator for Femtosecond and Nd:YAG Laser Pulses 990-0072

Variable Attenuator for Femtosecond and Nd:YAG Laser Pulses 990-0072

Variable attenuator / beamsplitter is made of kinematic mount with polarizer holder, equipped with thin film Brewster type polarizer and quartz half waveplate.

from 809 $
delivery Estimated delivery time: 4 - 5 days
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Description
Wavelength
Laser damage threshold
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For Nd:YAG Laser Pulses
Code Wavelength Laser damage threshold Price Delivery Add to cart
990-0072-355 355 nm 5 J/cm², 10 ns pulses, 10 Hz, 1064 nm 842 $ Request
990-0072-532 532 nm 5 J/cm², 10 ns pulses, 10 Hz, 1064 nm 809 $ Request
990-0072-1064 1064 nm 5 J/cm², 10 ns pulses, 10 Hz, 1064 nm 809 $ Request
For Femtosecond Laser Pulses
Code Wavelength Laser damage threshold Price Delivery Add to cart
990-0072-266 266 nm > 10 mJ/cm², 50 fs pulse, 800 nm 1045 $ Request
990-0072-343 343 nm > 10 mJ/cm², 50 fs pulse, 800 nm 985 $ Request
990-0072-400 400 nm > 10 mJ/cm², 50 fs pulse, 800 nm 952 $ Request
990-0072-515 515 nm > 10 mJ/cm², 50 fs pulse, 800 nm 952 $ Request
990-0072-800 800 nm > 10 mJ/cm², 50 fs pulse, 800 nm 968 $ 4 - 5 days
990-0072-800B 780-820 nm > 10 mJ/cm², 50 fs pulse, 800 nm 1078 $ Request
990-0072-1030 1030 nm > 10 mJ/cm², 50 fs pulse, 800 nm 979 $ Request
990-0072-1030B 1010-1050 nm > 10 mJ/cm², 50 fs pulse, 800 nm 1078 $ Request
For High Power Laser Applications
Code Wavelength Laser damage threshold Price Delivery Add to cart
990-0072-266H 266 nm > 100 mJ/cm², 50 fs pulse, 800 nm 1194 $ Request
990-0072-343H 343 nm > 100 mJ/cm², 50 fs pulse, 800 nm 1133 $ Request
990-0072-400H 400 nm > 100 mJ/cm², 50 fs pulse, 800 nm 1100 $ Request
990-0072-515H 515 nm > 100 mJ/cm², 50 fs pulse, 800 nm 1100 $ Request
990-0072-800H 800 nm > 100 mJ/cm², 50 fs pulse, 800 nm 1117 $ Request
990-0072-800HB 780-820 nm > 100 mJ/cm², 50 fs pulse, 800 nm 1227 $ Request
990-0072-1030H 1030 nm > 100 mJ/cm², 50 fs pulse, 800 nm 1128 $ Request
990-0072-1030HB 1010-1050 nm > 100 mJ/cm², 50 fs pulse, 800 nm 1227 $ Request

For Nd:YAG Laser Applications

Aperture diameter 22 mm
Damage threshold 5 J/cm2 pulsed at 1064 nm, typical
Polarization Contrast >1:200


For Femtosecond Applications

Aperture diameter 22 mm
Damage threshold
            for high power laser applications:
>10 mJ/cm2, 50 fs pulse at 800 nm, typical
>100 mJ/cm2, 50 fs pulse at 800 nm, typical
Time dispersion t<4 fs for 100 fs Ti:Sapphire laser pulses
Polarization Contrast >1:200
990-0072 Variable Attenuators for Linearly Polarized Laser Beam
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  • Divides laser beam into  two beams of manually adjustable intensity ratio separated by 68° angle
  • Large dynamic range
  • Transmitted beam shift ~1 mm
  • High optical damage threshold

 

This variable attenuator/beamsplitter consists of UV FS Thin Film Brewster Type Polarizer diameter 50.8 mm, which reflect s-polarized light while transmitting p-polarized light, that is housed into Beamsplitter Mount 840-0056-12 and a quartz Zero Order (optically contacted) Half Waveplate diameter 25.4 mm (for femtosecond applications) or Zero-Order Air-Spaced Half Waveplate (for high power applications) housed in rotating Polarizer Holder 840-0190-01, placed in the incident linearly polarized laser beam.

 

The intensity ratio of those two separated and different polarized beams may be continuously varied without alteration of other beam parameters by rotating the waveplate. The intensity of either exit beam, or their intensity ratio, can be controlled over a wide dynamic range. P-polarization could be selected for maximum transmission, or high-purity s-polarization could be reflected when maximum attenuation of the transmitted beam takes place.

 

840-0056-12 Kinematic Mount allows to adjust angle of incidence (AOI) of the thin film Brewster type polarizers by ±4.5° and to get the maximum extinction contrast. The mounts are on rods, rod holders and movable base 820-0090.

 

The optical axis height from the table top can be adjusten in the range of 78-88 mm. Other height can be offered as custom changing the standard rods and rod holders into higher.